@Article{KostovBarrUeda:2007:EfTaBi,
               author = "Kostov, K. G. and Barroso, Joaquim Jos{\'e} de and Ueda, 
                         M{\'a}rio",
          affiliation = "{Faculdade de Engenharia de Guaratinguet{\'a}. Universidade 
                         Estadual Paulista. (UNESP.FEG)} and {Instituto Nacional de 
                         Pesquisas Espaciais (INPE)} and {Instituto Nacional de Pesquisas 
                         Espaciais (INPE)}",
                title = "Effect of target bias on magnetic field enhanced plasma immersion 
                         ion implantation",
              journal = "Surface and Coatings Technology",
                 year = "2007",
               volume = "In press",
             keywords = "PIII, Computer simulation, Magnetic field, Sheath.",
             abstract = "Recent studies have demonstrated that sheath dynamics in plasma 
                         immersion ion implantation (PIII) is significantly affected by an 
                         external magnetic field, especially in the case when the magnetic 
                         field is parallel to the workpiece surface or intersects it at 
                         small angles. In this work we report the results from 
                         two-dimensional, particle-in-cell (PIC) computer simulations of 
                         magnetic field enhanced plasma immersion implantation system at 
                         different bias voltages. The simulations begin with initial 
                         low-density nitrogen plasma, which extends with uniform density 
                         through a grounded cylindrical chamber. Negative bias voltage is 
                         applied to a cylindrical target located on the axis of the vacuum 
                         chamber. An axial magnetic field is created by a solenoid 
                         installed inside the target holder. A set of simulations at a 
                         fixed magnetic field of 0.0025 T at the target surface is 
                         performed. Secondary electron emission from the target subjected 
                         to ion bombardment is also included. It is found that the plasma 
                         density around the cylindrical target increases because of intense 
                         background gas ionization by the electrons drifting in the crossed 
                         E × B fields. Suppression of the sheath expansion and increase of 
                         the implantation current density in front of the high-density 
                         plasma region are observed. The effect of target bias on the 
                         sheath dynamics and implantation current of the magnetic field 
                         enhanced PIII is discussed.",
                 issn = "0257-8972",
             language = "en",
           targetfile = "effect of target.pdf",
        urlaccessdate = "03 maio 2024"
}